Correlations among sputter pressure, thickness, and coercivity in Al/Co/Cu magnetic thin films sputter-deposited on Si(001)
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Date
2000Author
Barnes, Bryan M.
Kelly, John J., IV
MacKay, James F.
O'Brien, William L.
Lagally, Max G.
Publisher
Institute of Electrical and Electronics Engineers Inc
Metadata
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http://digital.library.wisc.edu/1793/8774Description
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Citation
Barnes, B.M., Kelly Iv, J.J., MacKay, J.F., O'Brien, W.L., & Lagally, M.G. (2000). Correlations among sputter pressure, thickness, and coercivity in Al/Co/Cu magnetic thin films sputter-deposited on Si(001). In 2000 International Magnetics Conference (INTERMAG 2000), Apr 9-12 2000, 36 (5 I), 2948-2950.