Deposited charge measurements on silicon wafers after plasma treatment
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Date
1996Author
Shohet, J. Leon
Nauka, Krysztof
Rissman, Paul
Publisher
IEEE, Piscataway, NJ, USA
Metadata
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http://digital.library.wisc.edu/1793/10388Description
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Citation
Shohet, J.L., Nauka, K., & Rissman, P. (1996). Deposited Charge Measurements On Silicon Wafers After Plasma Treatment. Ieee Transactions On Plasma Science, 24(1), 75-76.